Cylindrical target production method and cylindrical target
To supply a process for producing a cylindrical target that has virtually no distortion in the first direction. The process for producing a cylindrical target based on the present invention includes the steps of: processing a target material into a cylindrical shape; providing an adapter for attachment into a sputtering apparatus, in the target material processed into the cylindrical shape; and measuring a straightness in a longitudinal direction of an appearance of the target material having the adapter to validate whether the straightness of their object material having the adapter is within a predetermined range.
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Conventionally, planar goals are used for deposition by a sputtering method. Nonetheless, in recent decades, cylindrical goals, such as those cited in Patent Documents 1 to 3, are used because of their excellent efficacy. Forinstance, an aluminum target used since the insulation for liquid crystal displays (LCDs) or the like is usually cylindrical in shape with a span of 1,000 to 3,000 mm. A searchable goal is used in a deposition procedure that involves sputteringwhile rotating the goal. A plurality of cylindrical targets is usually downhill installed as a set at a sputtering apparatus.
If this kind of a cylindrical target has distortion, strange discharge is very likely to occur through sputtering, or the thickness of a deposited film will get uneven. Generally, most cylindrical targets are long, and therefore distortion,especially in the longitudinal direction of the goal, is debatable. If any distortion happens in the direction of one of the plurality of cylindrical targets, malfunction of the cylindrical target could occur because of the touch ofthe cylindrical target with a magnet, which was inserted into the cylindrical target, or strange discharge could be brought about by local strategy or touch between the cylindrical goal and its peripheral member, including a shield, attached to a outerpart of the cylindrical target. Furthermore, the cylindrical target is used while being rotated as stated previously. Because of this, if the cylindrical target has distortion in the first direction, the distance between the cylindrical target anda substrate on which the movie is deposited becomes uneven. This could make the thickness of the deposited movie irregular or may cause the exertion of a load onto a connection part that lies between the cylindrical objective and the sputtering apparatus,causing damage to or failure of the sputtering apparatus.
When a large-sized cylindrical target having a span exceeding 1 m is used at a sputtering device, generally, not just one, but three to twenty cylindrical targets function as a set. On the other hand, the existence of distortion in even one goal of thetarget set in the longitudinal direction would cause the malfunction, strange discharge, or uneven deposition, as stated above. In practice, cylindrical targets all which have no distortion in the longitudinal direction cannot be ready as aset.
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